Greatly reduced processing temperature for a solution-processed NiO x buffer layer in polymer solar cells

Abstract

By application of thermal annealing and UV ozone simultaneously, a solution-processed NiOx film can achieve a work function of approximately -5.1 eV at a temperature below 150°C, which allows the processing of NiOx that is compatible with fabrication of polymer solar cells (PSCs) on plastic substrates. The low processing temperature, which is greatly reduced from 250-400°C to 150°C, is attributed to the high concentration of NiOOH species on the film surface. This concentration will result in a large surface dipole and lead to increased work function. The pretreated NiOx is demonstrated to be an efficient buffer layer in PSCs based on polymers with different highest occupied molecular orbital energy levels. Compared with conventional poly(3,4-ethylenedioxy-thiophene): poly(styrenesulfonate)-buffered PSCs, the NiOx-buffered PSCs achieve similar or improved device performance as well as enhanced device stability. By applying thermal annealing and UV ozone treatment simultaneously to a solution-processed NiOx film, the processing temperature for converting it into a functional buffer layer is greatly reduced from over 300°C to below 150°C. The NiOx layer prepared by this dual treatment is compatible with low-temperature manufacturing processes on flexible plastic substrates. All the polymer solar cells demonstrated using the NiO x buffer layer have excellent performance and stability. © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.