Greatly reduced processing temperature for a solution-processed NiO x buffer layer in polymer solar cells

  • Zhai Z
  • Huang X
  • Xu M
 et al. 
  • 29

    Readers

    Mendeley users who have this article in their library.
  • 41

    Citations

    Citations of this article.

Abstract

By application of thermal annealing and UV ozone simultaneously, a solution-processed NiOx film can achieve a work function of approximately -5.1 eV at a temperature below 150 degrees C, which allows the processing of NiOx that is compatible with fabrication of polymer solar cells (PSCs) on plastic substrates. The low processing temperature, which is greatly reduced from 250-400 degrees C to 150 degrees C, is attributed to the high concentration of NiOOH species on the film surface. This concentration will result in a large surface dipole and lead to increased work function. The pretreated NiOx is demonstrated to be an efficient buffer layer in PSCs based on polymers with different highest occupied molecular orbital energy levels. Compared with conventional poly(3,4-ethylenedioxy-thiophene):poly(styrenesulfonate)-buffered PSCs, the NiOx-buffered PSCs achieve similar or improved device performance as well as enhanced device stability.

Author-supplied keywords

  • buffer layers
  • nickel oxides
  • polymer solar cells
  • solution processing

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document

Get full text

Authors

  • Zhichun Zhai

  • Xiaodong Huang

  • Meifeng Xu

  • Jianyu Yuan

  • Jun Peng

  • Wanli Ma

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free