Growth of Metal Nanowhiskers on Patterned Substrate by High Temperature Glancing Angle Deposition

  • Suzuki M
  • Kita R
  • Hara H
 et al. 
  • 15


    Mendeley users who have this article in their library.
  • 11


    Citations of this article.


In this study, we carry out high temperature glancing angle deposition (HT-GLAD) of Fe and Al on a heated substrate with trench patterns. When vapor is incident perpendicular to the trench direction, nanowhiskers grow only on the surface exposed to the vapor and not inside the trenches. When vapor is incident at a deposition angle larger than 80 degrees on the sidewall of the trench and not on the substrate surface, nanowhiskers grow only on the sidewall because the condition of deposition at a high temperature and a large deposition angle is satisfied only for the sidewall. Thus, we succeed in the selective growth of nanowhiskers by controlling the geometrical deposition conditions. Further, we also discuss the effect of the local deposition geometry on the growth process. Geometrically selective growth by HT-GLAD is expected to be useful for growing nanowhiskers on nano- and microstructured substrates.

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document


  • Motofumi Suzuki

  • Ryo Kita

  • Hideki Hara

  • Kenji Hamachi

  • Koji Nagai

  • Kaoru Nakajima

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free