A high-speed photoresist removal process using multibubble microwave plasma under a mixture of multiphase plasma environment

  • Ishijima T
  • Nosaka K
  • Tanaka Y
 et al. 
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This paper proposes a photoresist removal process that uses multibubble microwave plasma produced in ultrapure water. A non-implanted photoresist and various kinds of ion-implanted photoresists such as B, P, and As were treated with a high ion dose of 5 × 1015 atoms/cm2 at an acceleration energy of 70 keV; this resulted in fast removal rates of more than 1 μm/min. When the distance between multibubble microwave plasma and the photoresist film was increased by a few millimeters, the photoresist removal rates drastically decreased; this suggests that short-lived radicals such as OH affect high-speed photoresist removal.

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  • Tatsuo Ishijima

  • Kohei Nosaka

  • Yasunori Tanaka

  • Yoshihiko Uesugi

  • Yousuke Goto

  • Hideo Horibe

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