Improved quality GaN grown by molecular beam epitaxy using In as a surfactant

  • Widmann F
  • Daudin B
  • Feuillet G
 et al. 
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Abstract

The surfactant effect of In during the growth of GaN by molecular beam epitaxy has been investigated. It has been found that the presence of In modifies the diffusion kinetics in the growing GaN surface, leading to the observation of persistent reflection high energy electron diffraction intensity oscillations, characteristic of layer-by-layer growth. Electron microscopy studies revealed drastic modifications of the GaN structural properties associated with the presence of In during the growth. When grown in the presence of In, GaN exhibits an intense band edge luminescence, free of the component at 3.41 eV which is characteristic of defects associated with growth in N-rich conditions.

Author-supplied keywords

  • III-V semiconductors
  • electron microscopy
  • gallium compounds
  • molecular beam epitaxial growth
  • photoluminescence
  • reflection high energy electron diffraction
  • semiconductor epitaxial layers
  • semiconductor growth
  • surface diffusion

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Authors

  • F. Widmann

  • B. Daudin

  • G. Feuillet

  • N. Pelekanos

  • J. L. Rouvière

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