Influence of deposition parameters on the optical and structural properties of TiO2 films produced by reactive d.c. plasmatron sputtering

  • Schiller S
  • Beister G
  • Sieber W
 et al. 
  • 20

    Readers

    Mendeley users who have this article in their library.
  • 107

    Citations

    Citations of this article.

Abstract

We investigated the variations in the structure and optical properties of TiO2films produced by reactive d.c. plasmatron sputtering with the most important deposition parameters. Over a wide range, the phase composition (ratio of rutile to anatase) and the grain size of the TiO2films can be influenced in a controlled manner by variations in the substrate temperature and the oxygen partial pressure. Because of their high refractive index and low light-scattering losses, plasmatron-sputtered TiO2films are of great interest in the field of optical interference coatings, e.g. for dielectric multilayer stacks. © 1981.

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document

Authors

  • S. Schiller

  • G. Beister

  • W. Sieber

  • G. Schirmer

  • E. Hacker

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free