Influence of deposition parameters on the optical and structural properties of TiO2 films produced by reactive d.c. plasmatron sputtering

  • Schiller S
  • Beister G
  • Sieber W
 et al. 
  • 21


    Mendeley users who have this article in their library.
  • 106


    Citations of this article.


We investigated the variations in the structure and optical properties of TiO2films produced by reactive d.c. plasmatron sputtering with the most important deposition parameters. Over a wide range, the phase composition (ratio of rutile to anatase) and the grain size of the TiO2films can be influenced in a controlled manner by variations in the substrate temperature and the oxygen partial pressure. Because of their high refractive index and low light-scattering losses, plasmatron-sputtered TiO2films are of great interest in the field of optical interference coatings, e.g. for dielectric multilayer stacks. © 1981.

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document

Get full text


  • S. Schiller

  • G. Beister

  • W. Sieber

  • G. Schirmer

  • E. Hacker

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free