We investigated the variations in the structure and optical properties of TiO2films produced by reactive d.c. plasmatron sputtering with the most important deposition parameters. Over a wide range, the phase composition (ratio of rutile to anatase) and the grain size of the TiO2films can be influenced in a controlled manner by variations in the substrate temperature and the oxygen partial pressure. Because of their high refractive index and low light-scattering losses, plasmatron-sputtered TiO2films are of great interest in the field of optical interference coatings, e.g. for dielectric multilayer stacks. © 1981.
Mendeley saves you time finding and organizing research
Choose a citation style from the tabs below