p-i-n photodiodes with ND as low as 1–2 × 1015 cm−3 in the I-region were fabricated from InGaAsP (λ = 1.26 µm). At − 20 V, the 2.5 µm I-region of the 150 µm diameter mesas was completely swept out, the junction capacitance was below 1 pF, the dark current was less than 0.2 nA and the external quantum efficiency was 63% without a.r. coatings. © 1979, The Institution of Electrical Engineers. All rights reserved.
CITATION STYLE
Burrus, C. A., Dentai, A. G., & Lee, T. P. (1979). InGaAsP p-i-n photodiodes with low dark current and small capacitance. Electronics Letters, 15(20), 655–656. https://doi.org/10.1049/el:19790466
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