Ion sheath formation in radiofrequency inductive discharges

  • Braithwaite N
  • Haas F
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A new mechanism is proposed which accounts for the formation of a positively charged ion sheath in RF inductive discharges, and which allows the quantitative prediction of the existence of high plasma-to-wall potential in such discharges. In this paper we consider electron oscillations in crossed magnetic and magnetic-field-induced electric fields for both collisionless and collisional plasmas, under conditions relevant to plasma processing and gas discharge lamp applications. © 1994 IOP Publishing Ltd.

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  • N. St J. Braithwaite

  • F. A. Haas

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