Parallel writing by local oxidation nanolithography with submicrometer resolution

  • Cavallini M
  • Mei P
  • Biscarini F
 et al. 
  • 27


    Mendeley users who have this article in their library.
  • 61


    Citations of this article.


We demonstrate that the process of local oxidation of surfaces by atomic force microscopy (AFM) can be upscaled in a straightforward way by using a solid support with multiple protrusions as the cathode electrode. A metallized digital video disk DVD polymeric support has been used as a stamp to generate an array of features of variable length and 100 nm in width on a silicon surface covering a 5ラ6 mm2 region. The parallel patterning process involves the formation of as many liquid bridges as there are protrusions in the stamp. The growth rate of the parallel local oxides is slightly smaller than the one obtained by AFM experiments. Nonetheless, results from AFM local oxidation experiments can be readily extended to parallel oxidation which in turn opens the possibility of patterning centimeter-square regions with 10 nm motives.

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document


  • Massimiliano Cavallini

  • Paolo Mei

  • Fabio Biscarini

  • Ricardo García

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free