Perspective on stresses in magnetron‐sputtered thin films

  • Hoffman D
  • 32

    Readers

    Mendeley users who have this article in their library.
  • 80

    Citations

    Citations of this article.

Abstract

For nearly 10 years, J. A. Thornton and the present author pursued a series of investigations on a curious and initially obscure effect of intrinsic stress reversal in magnetron‐sputtered thin films. This study was first undertaken to understand the mechanical failures of decorative chromium when deposited on plastic automotive grilles. The present paper follows the evolution of these investigations in which the more than 1000 samples were mailed in small batches on a round trip between the author’s laboratory in the east and Thornton’s in the west. As the work developed it became clear that the structure‐sensitive stress reversal was a phenomenon of broad generality, which reflected subtle changes in the growth microstructures and accompanying properties of magnetron sputtered films. It was postulated that these changes resulted from particle bombardment fluxes controlled by sputtering process parameters. This review recalls various experiments that were conceived to explore mechanisms and map out the stress reversal locus in parameter space.

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document

Authors

  • D. W. Hoffman

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free