We report the photoluminescence (PL) and cathodoluminescence (CL) study of nanostructured
poly-crystalline silicon surface fabricated by lithography-less, reactive ion etching process.
Photoluminescence in visible range at room temperature with peak position between 630 nm and
720 nm is observed without any oxidation or annealing steps. X-ray photoemission (XPS) and
Auger electron spectroscopy (AES) revealed the presence of silicon oxide. The observed
cathodoluminescence in green and red regions of the visible spectrum are due to nano-scaled tips
and their coating with nonstoichiometric silicon oxide.
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