Piezoelectric nanoelectromechanical resonators based on aluminum nitride thin films

148Citations
Citations of this article
184Readers
Mendeley users who have this article in their library.
Get full text

Abstract

We demonstrate piezoelectrically actuated, electrically tunable nanomechanical resonators based on multilayers containing a 100-nm-thin aluminum nitride (AlN) layer. Efficient piezoelectric actuation of very high frequency fundamental flexural modes up to ∼80 MHz is demonstrated at room temperature. Thermomechanical fluctuations of AlN cantilevers measured by optical interferometry enable calibration of the transduction responsivity and displacement sensitivities of the resonators. Measurements and analyses show that the 100 nm AlN layer employed has an excellent piezoelectric coefficient, d31=2.4 pm/V. Doubly clamped AlN beams exhibit significant frequency tuning behavior with applied dc voltage. © 2009 American Institute of Physics.

Cite

CITATION STYLE

APA

Karabalin, R. B., Matheny, M. H., Feng, X. L., Defa, E., Le Rhun, G., Marcoux, C., … Roukes, M. L. (2009). Piezoelectric nanoelectromechanical resonators based on aluminum nitride thin films. Applied Physics Letters, 95(10). https://doi.org/10.1063/1.3216586

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free