Plasmonic films can easily be better: Rules and recipes

  • McPeak K
  • Jayanti S
  • Kress S
 et al. 
  • 416


    Mendeley users who have this article in their library.
  • 214


    Citations of this article.


High-quality materials are critical for advances in plasmonics, especially as researchers now investigate quantum effects at the limit of single surface plasmons or exploit ultraviolet- or CMOS-compatible metals such as aluminum or copper. Unfortunately, due to inexperience with deposition methods, many plasmonics researchers deposit metals under the wrong conditions, severely limiting perform- ance unnecessarily. This is then compounded as others follow their published procedures. In this perspective, we describe simple rules collected from the surface-science literature that allow high-quality plasmonic films of aluminum, copper, gold, and silver to be easily deposited with commonly available equipment (a thermal evaporator). Recipes are also provided so that films with optimal optical properties can be routinely obtained.

Author-supplied keywords

  • aluminum
  • copper
  • deposition
  • dielectric function
  • gold
  • plasmonics
  • relative permittivity
  • silver

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document


  • Kevin M. McPeak

  • Sriharsha V. Jayanti

  • Stephan J.P. Kress

  • Stefan Meyer

  • Aurelio Rossinelli

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free