Profile control of large-area rectangular plasma in a modified-magnetron-type RF discharge

  • Koshimizu T
  • Sato M
  • Ogawa U
 et al. 
  • 2

    Readers

    Mendeley users who have this article in their library.
  • 1

    Citations

    Citations of this article.

Abstract

A large-area rectangular modified-magnetron-type (MMT) radio frequency (RF) plasma source is newly developed and the properties are investigated in detail for producing a large-area uniform plasma. A quite uniform plasma with density variation less than several percent is produced in front of the rectangular substrate of 830×650 mm2. The spatial plasma uniformity is controlled not only by employing an upper auxiliary electrode but also by putting permanent magnets on the auxiliary electrode in several patterns. We now produce more uniform plasma by using auxiliary permanent magnets put on the upper auxiliary lid electrode. © 2002 Elsevier Science B.V. All rights reserved.

Author-supplied keywords

  • Chemical vapor deposition
  • Magnetron discharge
  • Plasma processing
  • RF discharge
  • Rectangular plasma

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document

Get full text

Authors

  • Takashi Koshimizu

  • Masanobu Sato

  • Unryu Ogawa

  • Satoru Iizuka

  • Noriyoshi Sato

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free