Sculpturing of photonic crystals by ion beam lithography: towards complete photonic bandgap at visible wavelengths.

  • Juodkazis S
  • Rosa L
  • Bauerdick S
 et al. 
  • 24

    Readers

    Mendeley users who have this article in their library.
  • 31

    Citations

    Citations of this article.

Abstract

Three dimensional (3D) ion beam lithography (IBL) is used to directly pattern 3D photonic crystal (PhC) structures in crystalline titania. The process is maskless and direct write. The slanted pore 3D structures with pore diameters of 100 nm having aspect ratio of 8 were formed. It is shown that chemical enhancement of titania removal up to 5.2 times is possible in XeF2 gas for the closest nozzle-to-sample distance; the enhancement was ∼ 1.5 times for the actual 3D patterning due to a sample tilt. Tolerances of structural parameters and optimization of IBL processing required for the fabrication of PhCs with full photonic bandgap in visible spectral range in rutile are outlined. Application potential of 3D-IBL is discussed.

Author-supplied keywords

  • Crystallization
  • Crystallization: methods
  • Ions
  • Light
  • Materials Testing
  • Photography
  • Photography: methods
  • Photons
  • Refractometry
  • Surface Properties
  • Titanium
  • Titanium: chemistry
  • Titanium: radiation effects

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document

Get full text

Authors

  • Saulius Juodkazis

  • Lorenzo Rosa

  • Sven Bauerdick

  • Lloyd Peto

  • Ramy El-ganainy

  • Sajeev John

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free