Self-assembled growth of epitaxial erbium disilicide nanowires on silicon (001)

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Abstract

By choosing a material that has an appropriate asymmetric lattice mismatch to the host substrate, in this case ErSi2 on Si(001), it is possible to grow one-dimensional epitaxial crystals. ErSi2 nanowires are less than one nanometer high, a few nanometers wide, close to a micron long, crystallographically aligned to 〈110〉Si directions, straight, and atomically regular. © 2000 American Institute of Physics.

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Chen, Y., Ohlberg, D. A. A., Medeiros-Ribeiro, G., Chang, Y. A., & Williams, R. S. (2000). Self-assembled growth of epitaxial erbium disilicide nanowires on silicon (001). Applied Physics Letters, 76(26), 4004–4006. https://doi.org/10.1063/1.126848

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