In this paper, the use of several metallo-organic compounds as precursors in a d.c. pulsed plasma-assisted CVD process is presented. One of the objectives of the work was to lower the coating temperature for the deposition of hard coatings on temperature-sensitive substrates. The layers being deposited were Ti(C,N), Zr(C,N) and Zr(B,C,N). The layers were deposited on hard metals, hardened steel and hardened aluminium alloys. The layers have been studied by scanning electron microscopy, wavelength-dispersive X-ray analysis, X-ray diffraction and ESCA. It is shown that hard and adhesive coatings can be obtained at low coating temperatures of about 150°C. © 1995.
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