SU-8 submicrometric sieves recorded by UV interference lithography

  • Gutierrez-Rivera L
  • Cescato L
  • 14


    Mendeley users who have this article in their library.
  • 15


    Citations of this article.


Sieves are promising devices for filtration, separation of particles and drug delivery control because of their uniform pore size distribution and low flow resistance. SU-8 is a negative photoresist type epoxy that is hydrophobic and biocompatible. Thus, it is a good alternative to fabricate micro devices for biological applications. In this paper we show a novel fabrication technique of self-sustained sieves of an SU-8 photoresist, with pore dimensions in the range of hundreds of nanometers, using a combination of UV interference and conventional optical lithographies. The resulting sieves are SU-8 membranes with submicrometric pore sizes and coefficient of variation of 7%, in areas of 1 cm 2 .

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document


  • Luis E. Gutierrez-Rivera

  • Lucila Cescato

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free