SU-8 submicrometric sieves recorded by UV interference lithography

  • Gutierrez-Rivera L
  • Cescato L
  • 14

    Readers

    Mendeley users who have this article in their library.
  • 15

    Citations

    Citations of this article.

Abstract

Sieves are promising devices for filtration, separation of particles and drug delivery control because of their uniform pore size distribution and low flow resistance. SU-8 is a negative photoresist type epoxy that is hydrophobic and biocompatible. Thus, it is a good alternative to fabricate micro devices for biological applications. In this paper we show a novel fabrication technique of self-sustained sieves of an SU-8 photoresist, with pore dimensions in the range of hundreds of nanometers, using a combination of UV interference and conventional optical lithographies. The resulting sieves are SU-8 membranes with submicrometric pore sizes and coefficient of variation of 7%, in areas of 1 cm 2 .

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document

Authors

  • Luis E. Gutierrez-Rivera

  • Lucila Cescato

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free