Thin organosilicon films for integrated optics.

  • Tien P
  • Smolinsky G
  • Martin R
  • 19

    Readers

    Mendeley users who have this article in their library.
  • 154

    Citations

    Citations of this article.

Abstract

The continued development of integrated optics is heavily dependent upon the availability of materials that are suitable for the construction of thin-film optical circuitry and devices. We report here an investigation of new films made by an rf discharge polymerization process of organic chemical monomers. We concentrate our discussion on films prepared from vinyltrimethylsilane and hexamethyldisilbxane. These films are smooth, tough, pinhole-free, transparent from 0.4 microm to 0.75 microm, and exhibit very low loss (

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document

Authors

  • P K Tien

  • G Smolinsky

  • R J Martin

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free