Ultrathin epitaxially grown bismuth (111) membranes

11Citations
Citations of this article
30Readers
Mendeley users who have this article in their library.
Get full text

Abstract

An ex situ cleaning and etching technique was applied to NaCl single crystals to prepare atomically flat and clean NaCl surfaces. These were used as substrates for molecular beam epitaxial growth of ultrathin continuous Bi(111) films. The high film quality-as studied with low energy electron diffraction, atomic force microscopy, and transmission electron diffraction-is attributed to the commensurate 10:7 ratio of the lattice constants. Dissolving the NaCl substrates in water allows the fabrication of freestanding 20 nm thin Bi(111) membranes of centimeter size. © 2008 American Institute of Physics.

Cite

CITATION STYLE

APA

Payer, T., Rajković, I., Ligges, M., Von Der Linde, D., Horn-Von Hoegen, M., & Meyer Zu Heringdorf, F. J. (2008). Ultrathin epitaxially grown bismuth (111) membranes. Applied Physics Letters, 93(9). https://doi.org/10.1063/1.2976558

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free