Cathodic Arc metal ion vapour etching and unbalanced magnetron deposition methode arc combined to the new ABSTM (Arc Bond Sputtering) PVD coating technique. The adhesion of hard coatings is increased and their internal stress may be minimized. Also the deposition of multi-component coatings like TiAIN is possible in an optimum manne by using the sputtering methode as coating technique. The new methode allows also the design of an extraordinary user friendly chamber and substrate frixturing. Threefold planetary rotation e.g. is used to coat HSS and cemented carbide cutting tools with TiN, TiCN or TiAIN coatings. The degree of ionization is adjustable by the use of electro magnets in the 4 unbalanced magnetrons. Therefore low temperature coatings like decorative coatings or CrN coatings on engineering components may be carried out under optimized process conditions.
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