Journal article

XPS study of TiOx thin films prepared by d.c. magnetron sputtering in Ar-O2 gas mixtures

Gouttebaron R, Cornelissen D, Snyders R, Dauchot J, Wautelet M, Hecq M ...see all

Surface and Interface Analysis, vol. 30, issue 1 (2000) pp. 527-530 Published by John Wiley & Sons Ltd

  • 24

    Readers

    Mendeley users who have this article in their library.
  • 57

    Citations

    Citations of this article.
Sign in to save reference

Abstract

Titanium oxide films have been deposited, at a pressure of 5 mTorr and a discharge current of 500 mA, on borosilicate glass substrates. We have studied in situ by XPS the dependence of film composition on oxygen partial pressure. All the experiments have been performed under high vacuum; there is no air contamination of film surfaces before XPS analysis. The ions produced in the plasma have been analysed by glow discharge mass spectrometry (GDMS). The stoichiometry of the films is compared to the plasma composition. The XPS results show that for an increasing oxygen partial pressure four regimes are observed. At very low oxygen concentration ({

Get free article suggestions today

Mendeley saves you time finding and organizing research

Sign up here
Already have an account ?Sign in

Find this document

Get full text

Authors

Cite this document

Choose a citation style from the tabs below

Save time finding and organizing research with Mendeley

Sign up for free