Journal article

XPS study of TiOx thin films prepared by d.c. magnetron sputtering in Ar-O2 gas mixtures

Gouttebaron R, Cornelissen D, Snyders R, Dauchot J, Wautelet M, Hecq M ...see all

Surface and Interface Analysis, vol. 30, issue 1 (2000) pp. 527-530 Published by John Wiley & Sons Ltd

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Titanium oxide films have been deposited, at a pressure of 5 mTorr and a discharge current of 500 mA, on borosilicate glass substrates. We have studied in situ by XPS the dependence of film composition on oxygen partial pressure. All the experiments have been performed under high vacuum; there is no air contamination of film surfaces before XPS analysis. The ions produced in the plasma have been analysed by glow discharge mass spectrometry (GDMS). The stoichiometry of the films is compared to the plasma composition. The XPS results show that for an increasing oxygen partial pressure four regimes are observed. At very low oxygen concentration ({

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