Abstract
Polymethyl methacrylate (PMMA) can be modified through the use of ultraviolet radiation and cross-linking agents to produce either topographic or refractive index structures. These techniques enable the fabrication of reflectors, gratings, photonic crystals and waveguides.
Cite
CITATION STYLE
APA
Rahman, F., Carbaugh, D. J., Wright, J. T., Rajan, P., Rohit, A., & Kaya, S. (2016). Photochemical Modification of Polymethyl Methacrylate (PMMA) for Producing Topographic and Refractive Index Contrast for Device Fabrication. In Optics InfoBase Conference Papers. Optica Publishing Group (formerly OSA).
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