Spontaneous electroless etching of silicon surfaces with hydrofluoric acid and chemical oxidant-based solutions is often referred to as "stain etching" due to the color change it imparts. The field is comprehensively reviewed with regard to the etching mechanisms and the range of chemical oxidants explored to date.
CITATION STYLE
Kolasinski, K. W. (2014). Porous silicon formation by stain etching. In Handbook of Porous Silicon (pp. 35–48). Springer International Publishing. https://doi.org/10.1007/978-3-319-05744-6_4
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