LOW TEMPERATURE GROWTH OF HgTe BY A UV PHOTOSENSITISATION METHOD.

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Abstract

The binary semi-metal HgTe is an end member of the important infrared detector alloy Cd//xHg//l// minus //xTe. This paper is concerned with the surface and crystalline quality of HgTe epitaxial layers grown onto InSb substrates over the temperature range 200-310 degree C. It is particularly important at these low temperatures to establish the structural quality of epitaxy because of the lower surface mobility of the reactants.

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APA

Irvine, S. J. C., Mullin, J. B., & Tunnicliffe, J. (1984). LOW TEMPERATURE GROWTH OF HgTe BY A UV PHOTOSENSITISATION METHOD. (pp. 234–238). Springer-Verlag (Springer Series in Chemical Physics 39). https://doi.org/10.1007/978-3-642-82381-7_31

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