Semiconductor physics in recent years centers on the fundamental interpretation of laser annealing. After a historical survey, the authors describe the crucial experiments and then discuss different theoretical approaches. They address two main questions: what is the extent of understanding of the physical mechanism of laser annealing and what is its applicability to industrial processes. For both aspects, they have to recognize the significant progress achieved in recent years.
CITATION STYLE
Balkanski, M. (1984). FUNDAMENTALS OF LASER ANNEALING. (pp. 2–13). Springer-Verlag (Springer Series in Chemical Physics 39). https://doi.org/10.1007/978-3-642-82381-7_1
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