Electrical Low-Frequency 1/ fγNoise Due to Surface Diffusion of Scatterers on an Ultra-low-Noise Graphene Platform

22Citations
Citations of this article
28Readers
Mendeley users who have this article in their library.

This article is free to access.

Abstract

Low-frequency 1/fγ noise is ubiquitous, even in high-end electronic devices. Recently, it was found that adsorbed O2 molecules provide the dominant contribution to flux noise in superconducting quantum interference devices. To clarify the basic principles of such adsorbate noise, we have investigated low-frequency noise, while the mobility of surface adsorbates is varied by temperature. We measured low-frequency current noise in suspended monolayer graphene Corbino samples under the influence of adsorbed Ne atoms. Owing to the extremely small intrinsic noise of suspended graphene, we could resolve a combination of 1/fγ and Lorentzian noise induced by the presence of Ne. We find that the 1/fγ noise is caused by surface diffusion of Ne atoms and by temporary formation of few-Ne-atom clusters. Our results support the idea that clustering dynamics of defects is relevant for understanding of 1/f noise in metallic systems.

Cite

CITATION STYLE

APA

Kamada, M., Laitinen, A., Zeng, W., Will, M., Sarkar, J., Tappura, K., … Hakonen, P. (2021). Electrical Low-Frequency 1/ fγNoise Due to Surface Diffusion of Scatterers on an Ultra-low-Noise Graphene Platform. Nano Letters, 21(18), 7637–7643. https://doi.org/10.1021/acs.nanolett.1c02325

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free