Focused ion beam and dielectrophoresis as grow-in-place architecture for chemical sensor

Abstract

In this work, we present a novel architecture for nanodevice manufacturing, combining an electrochemical process, such as dielectrophoresis, with focused ion beam apparatus. This approach simplifies the growth-pattern fabrication and simultaneously demonstrate the possibility to produce single nanowires of different materials with fully controlled dimensions, position, alignment and electrical contacting. Focused Ion Beam is used to deposit platinum microelectrodes on silicon/silicon nitride substrate. Dielectrophoresis is employed for assembling the single nanowire and precisely positioning it between the nanocontacts. Single nanowire based devices are tested as chemical sensors confirming the reliability of this innovative technology. © 2010 Springer Science+Business Media B.V.