Electrochemical deposition of silicon-carbon films: A study on the nucleation and growth mechanism

Abstract

Silicon-carbon films have been deposited on silicon and Al2O3/Cr-Cu substrates, making use of the electrolysis of methanol/dimethylformamide-hexamethyldisilazane (HMDS) solutions. The electrodeposited films were characterized by Raman spectroscopy and scanning electron microscopy, respectively. Moreover, the nucleation and growth mechanism of the films were studied from the experimental current transients.