Providing of Ultra-Thin Film Thickness Uniformity by Magnetron Sputtering from Two Sources

Abstract

To achieve high characteristics of single-photon detectors based on WSi thin films it is necessary to provide high film thickness uniformity more than 95%. This paper presents a mathematical modeling of the thickness uniformity of an ultra-thin film formed by magnetron sputtering from two sources, based on an experimentally determined mass flow from a single magnetron, depending on the location of the magnetrons relative to the substrate holder. According to the results of non-uniformity modeling, the requirements for the design and location of the magnetron unit in the chamber were made, which ensured the required non-uniformity of the film thickness of less than 5%.