Providing of Ultra-Thin Film Thickness Uniformity by Magnetron Sputtering from Two Sources

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Abstract

To achieve high characteristics of single-photon detectors based on WSi thin films it is necessary to provide high film thickness uniformity more than 95%. This paper presents a mathematical modeling of the thickness uniformity of an ultra-thin film formed by magnetron sputtering from two sources, based on an experimentally determined mass flow from a single magnetron, depending on the location of the magnetrons relative to the substrate holder. According to the results of non-uniformity modeling, the requirements for the design and location of the magnetron unit in the chamber were made, which ensured the required non-uniformity of the film thickness of less than 5%.

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Hydyrova, S., Akishin, M. Y., Vasilev, D. D., & Moiseev, K. M. (2020). Providing of Ultra-Thin Film Thickness Uniformity by Magnetron Sputtering from Two Sources. In IOP Conference Series: Materials Science and Engineering (Vol. 781). Institute of Physics Publishing. https://doi.org/10.1088/1757-899X/781/1/012012

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