The influence of RF power and gas pressure on the surface characteristics of aluminium oxide deposited by RF magnetron sputtering plasma

Abstract

Aluminium oxide thin films are deposited in the transition mode by RF magnetron sputtering of aluminium target at different applied RF power and different pressures of argon and oxygen gases. The films exhibit grainy surface microstructure with varying size and density. Nanostructured alumina film can be grown at lower gas pressure and optimized power. The chance for grain formation is lowered by the increase of power. Investigation reveals that it is possible to grow crystalline alumina film at low substrate temperature. Deposition conditions are optimized for protective alumina film coating on bell metal with good adhesion and corrosion resistance properties. © 2010 IOP Publishing Ltd.