Thermal oxidation is a common technique to manipulate macropore shape and realize a variety of novel structures in silicon. The stress and deformation induced by such oxidation, kinetics of oxide growth, and its anisotropy are reviewed. Uniform arrays of both silicon and silica microstructures such as needles and tubules have been realized via thermal oxidation.
CITATION STYLE
Astrova, E. V. (2014). Oxidation of macroporous silicon. In Handbook of Porous Silicon (pp. 589–598). Springer International Publishing. https://doi.org/10.1007/978-3-319-05744-6_60
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