Design and fabrication of far ultraviolet filters based on π-multilayer technology in high-k materials

Abstract

Application of π-multilayer technology is extended to high extinction coefficient materials, which is introduced into metal-dielectric filter design. Metal materials often have high extinction coefficients in far ultraviolet (FUV) region, so optical thickness of metal materials should be smaller than that of the dielectric material. A broadband FUV filter of 9-layer non-periodic Al/MgF 2 multilayer was successfully designed and fabricated and it shows high reflectance in 140-180 nm, suppressed reflectance in 120-137 nm and 181-220 nm.