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Surface plasmon assisted 26 fs, 0.4 keV electron pulse generation

Springer Series in Chemical Physics (2004) 79 667-669
DOI: 10.1007/3-540-27213-5_203
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Abstract

We report on the generation of 0.4 keV. 26-fs electron pulses using laser pulses from a low-intensity, 80 MHz repetition rate. Ti:Sapphire oscillator. This work is complemented with particle simulations using the finite-difference time-domain method.

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Irvine, S. E., & Elezzabi, A. Y. (2004). Surface plasmon assisted 26 fs, 0.4 keV electron pulse generation. In Springer Series in Chemical Physics (Vol. 79, pp. 667–669). https://doi.org/10.1007/3-540-27213-5_203

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