This chapter introduces the main vapor phase deposition techniques and their ability to homogeneously coat high surface area materials: evaporation, sputtering, chemical vapor deposition, and atomic layer deposition are covered in this chapter, which focuses on those aspects that are relevant to the coating of nanostructured materials.
CITATION STYLE
Yanguas-Gil, A. (2017). Physical and Chemical Vapor Deposition Techniques. In SpringerBriefs in Materials (pp. 19–37). Springer. https://doi.org/10.1007/978-3-319-24672-7_2
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