Skip to main content
Book Chapter

Mechanism of Dry Etching

  • Nojiri K
Springer International Publishing, (2015), 11-30
DOI: 10.1007/978-3-319-10295-5_2
N/ACitations
Citations of this article
32Readers
Mendeley users who have this article in their library.
Get full text

Abstract

Provides a comprehensive, systematic guide to dry etching technologies, from basics to latest technologies

Cite

CITATION STYLE

APA

Nojiri, K. (2015). Mechanism of Dry Etching. In Dry Etching Technology for Semiconductors (pp. 11–30). Springer International Publishing. https://doi.org/10.1007/978-3-319-10295-5_2

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free