Optimization of the X-ray incidence angle in photoelectron spectrometers

14Citations
Citations of this article
23Readers
Mendeley users who have this article in their library.

This article is free to access.

Abstract

The interplay between the angle-dependent X-ray reflectivity, X-ray absorption and the photoelectron attenuation length in the photoelectron emission process determines the optimal X-ray incidence angle that maximizes the photoelectron signal. Calculations in the wide VUV to the hard X-ray energy range show that the optimal angle becomes more grazing with increasing energy, from a few tens of degrees at 50 eV to about one degree at 3.5 keV. This is accompanied by an intensity gain of a few tens of times, as long as the X-ray footprint on the sample stays within the analyzer field of view. This trend is fairly material-independent. The obtained results bear immediate implications for the design of (synchrotron-based) photoelectron spectrometers. © 2013 International Union of Crystallography Printed in Singapore - all rights reserved.

Cite

CITATION STYLE

APA

Strocov, V. N. (2013). Optimization of the X-ray incidence angle in photoelectron spectrometers. Journal of Synchrotron Radiation, 20(4), 517–521. https://doi.org/10.1107/S0909049513007747

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free