CITATION STYLE
Schuhmacher, J., Martina, A., Satta, A., & Maexa, K. (2006). Atomic-layer Deposited Barrier and Seed Layers for Interconnects. In Materials for Information Technology (pp. 39–50). Springer-Verlag. https://doi.org/10.1007/1-84628-235-7_4
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