Atomic layer deposition for nanoscale oxide semiconductor thin film transistors: review and outlook

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Abstract

Highlights The history of oxide semiconductors and topics related to ALD-oxide semiconductors are reviewed. The benefits of ALD-oxide semiconductors for electronic devices applications are discussed. Challenging issues and the outlook for future development and scalability in industry are reviewed.

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Kim, H. M., Kim, D. G., Kim, Y. S., Kim, M., & Park, J. S. (2023, March 1). Atomic layer deposition for nanoscale oxide semiconductor thin film transistors: review and outlook. International Journal of Extreme Manufacturing. Institute of Physics. https://doi.org/10.1088/2631-7990/acb46d

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