Highlights The history of oxide semiconductors and topics related to ALD-oxide semiconductors are reviewed. The benefits of ALD-oxide semiconductors for electronic devices applications are discussed. Challenging issues and the outlook for future development and scalability in industry are reviewed.
CITATION STYLE
Kim, H. M., Kim, D. G., Kim, Y. S., Kim, M., & Park, J. S. (2023, March 1). Atomic layer deposition for nanoscale oxide semiconductor thin film transistors: review and outlook. International Journal of Extreme Manufacturing. Institute of Physics. https://doi.org/10.1088/2631-7990/acb46d
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