Diffusion in oxides

Abstract

Diffusion processes in crystalline oxides are governed by the same mechanisms as in crystalline metals, i.e. they proceed by means of point defects, and the two basic mechanisms are vacancy diffusion and interstitial diffusion. Both mechanisms have been described in detail in Chap. 1 of this book. There are, however, some important differences in the defect structures of oxides and metals, with severe implications for diffusion processes in oxides.