Characterization of punch-through phenomenon in SiC-SBD by capacitance-voltage measurement at high reverse bias voltage

5Citations
Citations of this article
6Readers
Mendeley users who have this article in their library.

Abstract

This paper investigates the punch-through phenomenon in SiC Schottky Barrier Diodes (SBD) from capacitance voltage (C V) characteristics at high reverse bias voltage. High voltage bias application has not been possible by conventional measurement instrumentation. The authors, therefore, develop C-V characteristics measurement instrumentation which enables the application of high dc bias voltages on SiC-SBD up to the rated reverse blocking voltage. The measurement is then validated through the comparison of results from different measurement methods. The proposed methods clearly reveal the punch-through phenomenon of measured SiC-SBD, and enable the extraction of pertinent parameters for device modeling. © IEICE 2006.

Cite

CITATION STYLE

APA

Funaki, T., Matsuzaki, S., Kimoto, T., & Hikihara, T. (2006). Characterization of punch-through phenomenon in SiC-SBD by capacitance-voltage measurement at high reverse bias voltage. IEICE Electronics Express, 3(16), 379–384. https://doi.org/10.1587/elex.3.379

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free