We study the axial strain relaxation in GaAs/InAs core-shell nanowire heterostructures grown by molecular beam epitaxy. Besides a gradual strain relaxation of the shell material, we find a significant strain in the GaAs core, increasing with shell thickness. This strain is explained by a saturation of the dislocation density at the core-shell interface. Independent measurements of core and shell lattice parameters by x-ray diffraction reveal a relaxation of 93% in a 35 nm thick InAs shell surrounding cores of 80 nm diameter. The compressive strain of -0.5% compared to bulk InAs is accompanied by a tensile strain up to 0.9% in the GaAs core. © 2013 American Institute of Physics.
CITATION STYLE
Biermanns, A., Rieger, T., Bussone, G., Pietsch, U., Grützmacher, D., & Ion Lepsa, M. (2013). Axial strain in GaAs/InAs core-shell nanowires. Applied Physics Letters, 102(4). https://doi.org/10.1063/1.4790185
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