Tunnel magnetoresistance in magnetic tunnel junctions with ZnS barrier

Abstract

A first experimental evidence of a significant tunneling magnetoresistance signal of about 5% at 300 K for a magnetic tunnel junction consisting of hard and soft magnetic layers separated by a 2 nm ZnS semiconducting barrier is reported. The samples have been grown by sputtering on Si(111) substrate at room temperature and have the following structure: Fe6 nmCu30 nmCoFe1.8 nmRu0.8 nmCoFe3 nmZnSxCoFe1 nmFe4 nmCu10 nmRu3 nm. The hard magnetic bottom electrode consists of the artificial antiferromagnetic structure in which the rigidity is ensured by the antiferromagnetic exchange coupling between two FeCo layers through a Ru spacer layer. Barrier impedance scanning microscope (BISM) measurements reveal a good homogeneity of the barrier thickness. Electric transport measurements over square tunnel elements with lateral sizes between 3 and 100 μm, exhibit a typical tunnel current-voltage variations and tunnel resistance of 2-3 kΩ μm2 with small variations which never exceed a factor of 2, which is in good agreement with the BISM results. This good reproducibility of the junctions is very promising for MRAMs and transistors applications. © 2001 American Institute of Physics.