Bulk Crystal Growth of Ternary III–V Semiconductors

Abstract

Ternary bulkcrystal growth of ternary III--V semiconductorsemiconductor substrates with variable bandgaps and lattice constants are key enablers for next-generation advanced electronic, optoelectronic, and photovoltaic devices. This chapter presents a comprehensive review of the crystal growth challenges and methods to grow large-diameter, compositionally homogeneous, bulk ternary III--V semiconductors based on As, P, and Sb compounds such as GaInSb, GaInAs, InAsP, AlGaSb, etc. The Bridgman and gradient freezing techniques are the most successfully used methods for growing ternary crystals with a wide range of alloy compositions. Control of heat and mass transport during the growth of ternary compounds is crucial for achieving high-quality crystals. Melt mixing and melt replenishment methods are discussed. The scale-up issues for commercial viability of ternary substrates is also outlined.