Electron beam lithography

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Abstract

Obtaining sub-20 nm lithography is not straightforward, even using a good tool with a sub-5 nm beam size. In this section, a brief overview of the various topics that will be covered in more depth in the rest of the chapter is given.

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APA

Thoms, S. (2012). Electron beam lithography. In Nanofabrication Handbook (pp. 9–40). CRC Press. https://doi.org/10.1201/b11626

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