Obtaining sub-20 nm lithography is not straightforward, even using a good tool with a sub-5 nm beam size. In this section, a brief overview of the various topics that will be covered in more depth in the rest of the chapter is given.
CITATION STYLE
Thoms, S. (2012). Electron beam lithography. In Nanofabrication Handbook (pp. 9–40). CRC Press. https://doi.org/10.1201/b11626
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