ANALISA PENGARUH REDUKSI TERMAL TERHADAP KERUSAKAN STRUKTUR (STRUCTURAL-DISORDER) PADA LAPISAN TIPIS GRAPHENE OXIDE TEREDUKSI

Abstract

Abstrak Tujuan penelitian ini adalah menganalisa kerusakan struktur pada lapisan tipis graphene oxide setelah direduksi pada temperatur reduksi yang bervariasi. Lapisan tipis graphene oxide yang disintesis menggunakan metode Hummers direduksi secara termal pada variasi temperatur 350 0 C dan 850 0 C selama 2 jam dalam pemanas vakum (~10-3 Torr). Kuantitas defect sampel dikarakterisasi menggunakan Raman Spectroscopy sedangkan mikrostrukturnya dikarakterisasi menggunakan SEM (Scanning Electron Microscope). Persentase (kuantitas) defect pada graphene oxide dinyatakan dengan ID/IG. Nilai ID/IG graphene oxide, graphene oxide tereduksi pada temperatur 350 0 C dan 850 0 C secara berurutan adalah 0.958, 0.823 dan 1.102. Nilai ID/IG tersebut menunjukkan bahwa kuantitas defect graphene oxide berkurang setelah direduksi pada suhu 350 0 C tetapi bertambah saat direduksi pada suhu 850 0 C. Hasil gambar SEM menunjukkan bahwa lapisan tipis graphene oxide menkerut setalah direduksi pada temperatur 350 0 C dan berubah menjadi material seperti graphite berpori (porous stacked-layer graphite) setelah direduksi pada temperatur 850 0 C. Kata-kata kunci: graphene oxide tereduksi, reduksi termal, kerusakan struktur. Abstract The aim of this research is to analyse the structural-defect of graphene oxide reduced at various reduction temperatures. Graphene oxide thin film synthesized by Hummers method was thermally reduced at the temperature of 350 0 C and 850 0 C for 2 hours in vacuum condition (~10-3 Torr). The presence of defects was characterized by Raman spectroscopy while the material's microstructure was characterized by SEM (Scanning Electron Microscope). A measure of defects existing on graphene oxide was represented by a ratio of D peak intensity and G peak intensity (ID/IG). The ID/IG value of raphene oxide and graphene oxide which is thermally reduced at 350 0 C and 850 0 C was 0.598, 0.823 and 1.102, respectively. Those ID/IG indicated that the quantity of defect was diminished after thermal reduction at 350 0 C, yet it was increased after severe thermal reduction at 850 0 C. SEM images of samples indicated the wrinkled graphene oxide thin film after thermal reduction at 350 0 C and it formed a porous stacked-graphite like material after severe thermal reduction at 850 0 C