Control of micro- and nanopatterns of octadecyltrimethoxysilane monolayers using nanoimprint lithography and atmospheric chemical vapor deposition

Abstract

Octadecyltrimethoxysilane (OTMS) self-assembled monolayers have been grafted on micrometric and nanometric areas of SiO2∕Si substrates using a process combining nanoimprint lithography and atmospheric chemical vapor deposition. The optimization of the process has lead to monolayer square patterns of OTMS with lateral sizes ranging from 2μm down to 50nm. Their coverage uniformity extends on several square millimeters. Their coverage density can be accurately tuned by the deposition time.