Microdeposition of chromium metal and indium oxide microstructures via femtosecond KrF excimer laser (248 nm) ablation in a forward-transfer mode has been studied. The short pulse length, the short absorption length, and the consequently limited thermal diffusion, lower the ablation threshold and enable the deposition of high-definition features. Experiments carried out in a low-vacuum (0.1 Torr) environment result in highly reproducible, well-adhered structures of submicron size. Microdeposition of Cr and polycrystalline In2O3 on glass and silicon substrates is performed. The superior quality of the results allows the direct, one-step fabrication of binary-amplitude and multilevel optical diffractive structures. © Springer-Verlag 1998.
CITATION STYLE
Zergioti, I., Mailis, S., Vainos, N. A., Papakonstantinou, P., Kalpouzos, C., Grigoropoulos, C. P., & Fotakis, C. (1998). Microdeposition of metal and oxide structures using ultrashort laser pulses. Applied Physics A: Materials Science and Processing, 66(5), 579–582. https://doi.org/10.1007/s003390050717
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