Porous silicon formation by metal nanoparticle-assisted etching

Abstract

Essential aspects in the fabrication of porous silicon and nanostructures by metal-assisted particle etching are presented. Basic processes using 1-step or 2-step method are described as well as mechanism of metal-assisted chemical etching. Influence of various parameters such as nature of metal, temperature, etching solution composition, intrinsic properties of silicon substrate on the morphology of porous silicon, or nanostructures is discussed. Applications of silicon nanostructures obtained by metal-assisted etching are briefly introduced, showing the promising potential of this etching method whose main properties are simplicity, low cost, easy process control, reproducibility, and reliability for fabrication of silicon nanostructures including silicon nanowires.