Local oxide growth mechanisms on nickel films

5Citations
Citations of this article
16Readers
Mendeley users who have this article in their library.

Abstract

The oxidation characteristics of nickel thin films were investigated by atomic force microscopy (AFM) anodization. The anodization parameters, such as anodized voltages, oxidation times, pulse voltage periods and how they affected the creation and growth of the oxide nanostructures were explored. The results showed that the height of the nickel oxide nanodots grew as a result of either the anodization time or the anodized voltage being increased. The oxide growth rate was dependent on the anodized voltage and on the resulting electric field strength. Furthermore, as the electric field strength was at an order of 2 × 109 Vm-1, the anodization rate decreased quickly and the oxide dots stopped growing. © 2007 The Japan Institute of Metals.

Cite

CITATION STYLE

APA

Fang, T. H., & Chen, K. J. (2007). Local oxide growth mechanisms on nickel films. Materials Transactions, 48(3), 471–475. https://doi.org/10.2320/matertrans.48.471

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free