Epitaxial Al2O3 capacitors for low microwave loss superconducting quantum circuits

10Citations
Citations of this article
31Readers
Mendeley users who have this article in their library.

Abstract

We have characterized the microwave loss of high-Q parallel plate capacitors fabricated from thin-film Al/Al2O3/Re heterostructures on (0001) Al2O3 substrates. The superconductor-insulator-superconductor trilayers were grown in situ in a hybrid deposition system: the epitaxial Re base and polycrystalline Al counterelectrode layers were grown by sputtering, while the epitaxial Al 2O3 layer was grown by pulsed laser deposition. Structural analysis indicates a highly crystalline epitaxial Al2O3 layer and sharp interfaces. The measured intrinsic (low-power, low-temperature) quality factor of the resonators is as high as 3 × 104. These results indicate that low-loss grown Al2O3 is an attractive candidate dielectric for high-fidelity superconducting qubit circuits. © 2013 Author(s).

Cite

CITATION STYLE

APA

Cho, K. H., Patel, U., Podkaminer, J., Gao, Y., Folkman, C. M., Bark, C. W., … Eom, C. B. (2013). Epitaxial Al2O3 capacitors for low microwave loss superconducting quantum circuits. APL Materials, 1(4). https://doi.org/10.1063/1.4822436

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free