We have characterized the microwave loss of high-Q parallel plate capacitors fabricated from thin-film Al/Al2O3/Re heterostructures on (0001) Al2O3 substrates. The superconductor-insulator-superconductor trilayers were grown in situ in a hybrid deposition system: the epitaxial Re base and polycrystalline Al counterelectrode layers were grown by sputtering, while the epitaxial Al 2O3 layer was grown by pulsed laser deposition. Structural analysis indicates a highly crystalline epitaxial Al2O3 layer and sharp interfaces. The measured intrinsic (low-power, low-temperature) quality factor of the resonators is as high as 3 × 104. These results indicate that low-loss grown Al2O3 is an attractive candidate dielectric for high-fidelity superconducting qubit circuits. © 2013 Author(s).
CITATION STYLE
Cho, K. H., Patel, U., Podkaminer, J., Gao, Y., Folkman, C. M., Bark, C. W., … Eom, C. B. (2013). Epitaxial Al2O3 capacitors for low microwave loss superconducting quantum circuits. APL Materials, 1(4). https://doi.org/10.1063/1.4822436
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